RXO company founder and president,
David L. Windt, studied physics at the University of Connecticut, and received
a Ph.D. in physics from the University of Colorado in 1987. He has held
research positions at Columbia University, Bell Laboratories, and the Lockheed
Palo Alto Research Laboratory. His research over the past 20+ years has
focused largely on the development of multilayer X-ray optics for a variety of
scientific and technological applications.
David L.
Windt: CV
David
L. Windt: Publications
David L. Windt (GPG
Public Key)
Selected Publications (preprints and reprints)
Performance optimization
of Si/Gd extreme ultraviolet
multilayers
D. L. Windt, J. A. Bellotti, B. Kjornrattanawanich, and J. F. Seely,
App. Opt. 48, 5502 –
5508 (2009)
Performance,
structure and stability of SiC/Al multilayer films for extreme ultraviolet
applications
D. L. Windt and J. A. Bellotti, App. Opt. 48, 4932 –
4941 (2009)
Normal-incidence
silicon–gadolinium multilayers for imaging at 63 nm wavelength
B. Kjornrattanawanich, D. L. Windt and J. F. Seely, Opt. Lett., 33, 465 (2008)
Reduction
of stress and roughness by reactive sputtering in W/B4C multilayer
films
D. L. Windt, Proc. SPIE, 6688 (2007)
Terbium-based
extreme ultraviolet multilayers
D. L. Windt, J. F. Seely, B. Kjornrattanawanich, and Yu. A. Uspenskii, Opt.
Lett., 30, 3186 - 3188 (2005)
Stability of EUV multilayers to long-term heating, and to energetic protons and
neutrons, for extreme solar missions
A. D. Rousseau, D. L. Windt, B. Winter, L. Harra, H. Lamoureux, and F.
Eriksson, Proc. SPIE, 5900 (2005)
Development
and testing of EUV multilayer coatings for the Atmospheric Imaging Assembly
aboard the Solar Dynamics Observatory
R. Soufli, D. L. Windt, J. C. Robinson, S. L. Baker, E. Spiller, F. J. Dollar,
A. L. Aquila, E. M. Gullikson, B. Kjornrattanawanich, J. F. Seely, L. Golub, Proc.
SPIE, 5901 (2005)
Experimental
comparison of extreme-ultraviolet multilayers for solar physics
D. L. Windt, S. Donguy, J. Seely and B. Kjornrattanawanich, App.
Opt. 43, 1835 – 1848 (2004)
Normal-incidence
efficiencies of multilayer-coated laminar gratings for the Extreme-Ultraviolet
Imaging Spectrometer on the Solar-B mission
J. F. Seely, C. M. Brown, D. L. Windt, S. Donguy and B.
Kjornrattanawanich, App. Opt., 43, 1463 - 1471 (2004)
EUV
multilayers for solar physics
D. L. Windt, S. Donguy, J. Seely, B. Kjornrattanawanich, E. M. Gullikson, C. C.
Walton, L. Golub, E. DeLuca, Proc. SPIE, 5168, 01 (2003)
Optical
constants for hard x-ray multilayers over the energy range E=35 - 180 keV
D. L. Windt, S. Donguy, C. J. Hailey, J. Koglin, V. Honkimaki, E. Ziegler, F.
E. Christensen, F. A. Harrison, Proc. SPIE, 5168, 06 (2003)
W/SiC
X-ray multilayers optimized for use above 100 keV,
D. L. Windt, S. Donguy, C. J. Hailey, J. Koglin, V. Honkimaki, E. Ziegler, F.
E. Christensen, C. M. H. Chen, F. A. Harrison, W. W. Craig, Proc. SPIE,
4851, 639 (2002) & App. Opt., 42, 2415 - 2421 (2003)
Microstructure
of thin tantalum films sputtered onto inclined substrates: Experiments and
atomistic simulations,
J. Dalla Torre, G. H. Gilmer, D. L. Windt, R. Kalyanaraman, F. H. Baumann, P.
L. O'Sullivan, J. Sapjeta, T. Diaz de la Rubia, and M. Djafari Rouhani, J.
App. Phys., 94, 263 - 271 (2003)
Normal-incidence
reflectance of optimized W/B4C X-ray multilayers in the range 1.4 nm
< lambda < 2.4 nm,
D. L. Windt, E. M. Gullikson, C. C. Walton, Opt. Lett., 27, 2212-2214
(2002)
Diffraction-limited
astronomical X-ray imaging and X-ray interferometry using normal-incidence
multilayer optics,
D. L. Windt, S. M. Kahn, G. E. Sommargren, Proc. SPIE, 4851, 441 (2002)
Diffraction-limited
astronomical X-ray imaging and soft X-ray interferometry using multilayer
optics (poster, 6.4MB),
D. L. Windt, S. M. Kahn, and G. E. Sommargren, BAAS, 34, 744 (2002)
The
feasibility of detecting 'cosmological' gray dust,
D. L. Windt, Ap. J. L., 564, L61 (2002)
A
photometric imaging solar telescope, tunable in the extreme ultraviolet,
utilizing multilayer X-ray optics,
L. Golub, E. DeLuca, P. Hamilton, G. Nystrom, D. L. Windt, W. K. H. Schmidt and
A. Dannenberg, Rev. Sci. Instr., 73, 1908 (2002)
Growth,
structure and performance of depth-graded W/Si multilayers for hard X-ray
optics,
D. L. Windt , F. E. Christensen, W. W. Craig, C. Hailey, F. A. Harrison, M.
Jimenez-Garate, R. Kalyanaraman, and P. H. Mao, J. Appl. Phys., 88, 460
(2000)
X-ray
multilayer coatings for use at energies above 100 keV
D. L. Windt , F. E. Christensen, W. W. Craig, C. Hailey, F. A. Harrison, M.
Jimenez-Garate, R. Kalyanaraman, and P. H. Mao, Proc. SPIE, 4012, 442
(2000)
Stress,
microstructure and stability of Mo/Si, W/Si, and Mo/C multilayer films
D. L. Windt , J. Vac. Sci. Technol. A, 18, 980-991 (2000)
The
scattering of X-rays by interstellar dust on the micro-arcsecond scale
D. L. Windt, W. C. Cash and S. M. Kahn Ap. J., 528, 306-309 (2000)
Growth
and structure of metallic barrier layer and interconnect films I: experiments
D. L. Windt, J. Dalla Torre, G. H. Gilmer, J. Sapjeta, R. Kalyanaraman, F. H.
Baumann, P. L. O'Sullivan, D. Dunn, R. Hull Proc. MRS, 564, 307-312
(1999)
Growth
and structure of metallic barrier layer and interconnect films II: atomistic simulations
of film deposition onto inclined surfaces
J. Dalla Torre, G. H. Gilmer, D. L. Windt, F. H. Baumann, R. Kalyanaraman,
Hanchen Huang, T. Diaz de la Rubia, and M. Djafari Rouhani Proc. MRS, 564,
(1999)
Low-stress
W/Cr films for SCALPEL mask scattering layers
D. L. Windt, J. Vac. Sci. Technol. B, 17, 1385-1389 (1999)
Amorphous
carbon films for use as both variable-transmission apertures and attenuated
phase-shift masks for DUV lithography
D. L. Windt and R. A. Cirelli, J. Vac. Sci. Technol. B, 17, 930-932
(1999)
Periodic
and depth-graded Cu/Si multilayer films for hard X-ray optics
D. L. Windt, App. Phys. Letters, 74, 2890-2892 (1999)
Multilayer
films for figured X-ray optics
D. L. Windt, Proc. SPIE 3448 (1998)
IMD:
Software for modeling the optical properties of multilayer films
D. L. Windt, Computers in Physics, 12, 360-370 (1998)
Variation
in stress with background pressure in sputtered Mo/Si multilayer films
D. L. Windt, W. L. Brown, C. A. Volkert, and W. K. Waskiewicz, J. Appl.
Phys., 78 2423-2430 (1995)
Multilayer
facilities required for extreme-ultraviolet lithography
D. L. Windt and W. K. Waskiewicz, J. Vac. Sci. Technol. B, 12, 3826-3832
(1994)
Surface
finish requirements for soft x-ray mirrors
D. L. Windt, W. K. Waskiewicz, and J. E. Griffith, App. Op., 33,
2025-2031 (1994)