The 10th International Conference
Physics of X-RayMultilayerStructures
February 14-18, 2010
Big Sky Resort, Montana
Nanometer-scale multilayer films optimized for their X-ray optical properties have enabled the construction of a variety of new optical elements and instruments operating in the EUV, soft X-ray and hard X-ray spectral regions. X-ray multilayer technology is by now used for a wide range of scientific and industrial applications, including photolithography, astronomy and solar physics, plasma physics, synchrotron radiation, X-ray lasers, ultrashort-pulse physics, X-ray crystallography, and others. Emerging free-electron laser and nano-focusing applications, using intense, coherent radiation, are placing ever more stringent requirements on X-ray multilayer stability and performance. Continued advancement in all of these areas depends on further improvements in multilayer technology, which in turn requires a deeper understanding of the X-ray optical physics and material science of these structures.
The 10th International Conference on the Physics of X-Ray Multilayer Structures, to be held at the Big Sky Resort in Montana, USA, is intended to help advance the field of multilayer technology by bringing together researchers from around the world in an informal, relaxed and intimate setting, with plenty of free time in order to promote discussion and the free exchange of new ideas. Our hope is that these interactions, supplemented by contributed talks and posters, as well as invited talks on especially novel, innovative or comprehensive research, will lead to new ideas and opportunities for research and collaboration.
Contributed papers are solicited on any topic relating to X-ray multilayers that falls within the general scope of the PXRMS'10 conference, including film growth, interface formation, microstructure development, X-ray performance, thin film characterization techniques, etc., as well as new applications of planar, free standing, and figured multilayer X-ray optics.